The sample is placed in a vacuum and irradiated with 4nm to 100m electron beams, then the image is acquired from the intensity of characteristic X-rays, backscattered electrons, or secondary electrons generated from the measurement site.
Usage
(1) Element segregation, mapping examination
(2) Comparison of tint between elements
(3) Surface analysis
Device specifications
Equipment name
JXA-|8900RL
EPMA-1600
Accelerating voltage
0.2 to 30kV
0.5 to 30kV
Irradiation current
1x10-12to 1x10-6A
1x10-12to 2x10-7A
Analyzed elements
5B to 92U
5B to 92U
No. of WDX equipped (wavelength dispersion X-ray spectrometry)
5-channel
5-channel
EDS (energy dispersion X-ray spectrometry)
8-element simultaneous analysis
-
X-ray take off angle
40°
52.5°
Surface resolution
1μm
1μm
Daido Bunseki Research, Inc. 2-30 Daido-cho, Minami-ku, Nagoya 457-8545 Phone: 052-611-9434 Fax: 052-611-9948